VIP - Vakuum in Forschung und Praxis 3 / 2023

Cover

Mächtiges „Drumherum“ für möglichst wenig „Innendrin“ – so schauen wir bei Vakuumanlagen naturgegeben auf das Äußere und schätzen das Innere. (Bild: yblaz - stock.adobe.com)

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3/2023Seite 1

Vakuum in Forschung und Praxis 3/2023

Titelbild: Vakuum in Forschung und Praxis 3/2023

Editorial

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V2023 – Der Branchentreff im Herbst: Mit Vakuum-Oberflächentechnik die Kerntechnologien zukünftiger Innovationen stützen

Prof. Dr. techn. Dipl.-Ing. Udo Klotzbach

Inhalt: Vakuum in Forschung und Praxis 3/2023

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Vakuum

The “LED-version” of the electron gun: An electron source for operation in ambient pressure environments based on silicon field emitter arrays

M. Bachmann F. Düsberg A. Pahlke S. Edler A. Schels F. Herdl M. Hausladen P. Buchner R. Schreiner

We report on our progress to develop and optimize electron sources for practical applications. A simple fabrication process is introduced based on a wafer dicing saw and a wet chemical etch step without the need for a clean room. Due to the formation of crystal facets the samples show a homogeneous geometry throughout the array. Characterization techniques are developed to systematically compare various arrays. A very defined measurement procedure based on current controlled IV-sweeps as well as lifetime measurements at various currents is proposed. To investigate the current distribution in the array a commercial CMOS detector is used and shows the potential for in depth analysis of the arrays. Finally, a compact hermetically sealed housing is presented enabling electron generation in atmospheric pressure environments.

Plasma

Enhanced High Power Impulse Magnetron Sputter Processes: The trick with the kick

J. R. Gaines

High power impulse magnetron sputtering (HIPMS) has emerged as a useful approach for depositing highly dense and smooth coatings of electrically conductive materials. Recent advances in power supply technology have further enabled HIPMS through the addition of a positive kick in the pulse cycle which supplies a bias at the surface of the sputter target which expels sputter target ions and sends more charged adatoms toward the substrate. This has been demonstrated with critical materials like diamond-like carbon and plasmonic materials. Material specific pulse magnitudes and durations can be developed to achieve new novel thin film morphologies.

Anwenderbericht

Ideal abgestimmt auf jeden Prozess: Frequenzgeregelter Antrieb von Vakuumpumpen reduziert Energie- und Wartungskosten sowie CO2-Emmissionen

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