Mächtiges „Drumherum“ für möglichst wenig „Innendrin“ – so schauen wir bei Vakuumanlagen naturgegeben auf das Äußere und schätzen das Innere. (Bild: yblaz - stock.adobe.com)
VIP - Vakuum in Forschung und Praxis 3 / 2023
Vakuum in Forschung und Praxis 3/2023
V2023 – Der Branchentreff im Herbst: Mit Vakuum-Oberflächentechnik die Kerntechnologien zukünftiger Innovationen stützen
The “LED-version” of the electron gun: An electron source for operation in ambient pressure environments based on silicon field emitter arrays
We report on our progress to develop and optimize electron sources for practical applications. A simple fabrication process is introduced based on a wafer dicing saw and a wet chemical etch step without the need for a clean room. Due to the formation of crystal facets the samples show a homogeneous geometry throughout the array. Characterization techniques are developed to systematically compare various arrays. A very defined measurement procedure based on current controlled IV-sweeps as well as lifetime measurements at various currents is proposed. To investigate the current distribution in the array a commercial CMOS detector is used and shows the potential for in depth analysis of the arrays. Finally, a compact hermetically sealed housing is presented enabling electron generation in atmospheric pressure environments.
High power impulse magnetron sputtering (HIPMS) has emerged as a useful approach for depositing highly dense and smooth coatings of electrically conductive materials. Recent advances in power supply technology have further enabled HIPMS through the addition of a positive kick in the pulse cycle which supplies a bias at the surface of the sputter target which expels sputter target ions and sends more charged adatoms toward the substrate. This has been demonstrated with critical materials like diamond-like carbon and plasmonic materials. Material specific pulse magnitudes and durations can be developed to achieve new novel thin film morphologies.